atomic layer deposition of insulating hafnium and zirconium genus تولید کننده درک توانایی تولید قوی ، قدرت تحقیق پیشرفته و خدمات عالی ، شانگهای atomic layer deposition of insulating hafnium and zirconium genus تأمین کننده ارزش ایجاد می کند و برای همه مشتری ارزش ایجاد می کند.
An atomic layer deposited ZrAlxOy dielectric ... Zirconium and/or hafnium ... "Atomic layer Deposition of Zirconium Titanium Oxide from Titanium ...
Electronic apparatus and methods of forming the electronic apparatus include a HfSiON film on a substrate for use in a variety of electronic systems. The HfSiON film ...
The use of atomic layer deposition ... Forming the dielectric structure includes depositing zirconium oxide using atomic layer deposition using precursor ...
In some embodiments aluminum fluoride thin films are deposited by ... comprises hafnium or zirconium. ... for atomic layer deposition of hafnium ...
... titanium and zirconium by atomic layer deposition includes ... in insulating layer: ... Deposition of hafnium oxide and/or zirconium oxide and ...
... on the hafnium metal layer by atomic layer deposition form a hafnium oxide dielectric ... Atomic layer deposited ... Atomic layer deposited zirconium ...
... layers provide an insulating layer in a variety of ... to deposit hafnium by atomic layer deposition. ... zirconium oxide atomic layer deposited ...
... such insulating layer may be advantageously used as a passivation layer in ... and an insulating layer deposited on the substrate by Atomic Layer Deposition ...
... provide an insulating layer in a variety of ... hafnium by atomic layer deposition. The hafnium may be deposited ... zirconium oxide atomic layer ...
Atomic layer deposited dielectric layers ... a lanthanum hafnium oxide layer is formed by depositing hafnium and lanthanum by atomic layer deposition onto a ...
... a zirconium and/or hafniumcontaining layer on ... the formation of the insulating layer formation by a deposition process ... "Atomic layer deposition ...
Atomic layer deposited dielectric layers containing a lanthanum hafnium oxide layer and methods of fabricating such dielectric layers provide an insulating layer in a ...
The metal compounds have surprisingly and significantly improved uniformity when deposited by atomic layer deposition ... Zirconium and/or hafnium ... insulating ...
... comprising depositing a hafnium compound by atomic layer deposition to ... Zirconium and/or hafnium ... Method for forming gate insulating layer having ...
... "ALD Metal Oxide Deposition Process Using Direct ... ALD metal oxide deposition process using direct oxidation: ... atomic layer deposition of hafnium ...
The dielectric structure is formed by depositing hafnium by atomic layer deposition onto ... a insulating layer is ... "Atomic Layer Deposition of Zirconium ...
... a zirconium and/or hafniumcontaining layer on ... nitrogendoped polysilicon), a metallic layer 60, insulating ... Atomic layer deposition of zirconiumdoped ...
A dielectric layer containing an atomic layer deposited insulating metal oxide film having multiple ... Genus, Inc. Vertically ... Atomic layer deposition of ...
... metal layer by atomic layer deposition form a hafnium oxide ... in insulating layer: ... Atomic layer deposited zirconium silicon oxide ...
... a zirconium and/or hafniumcontaining layer on a ... a substrate in a vapor deposition process. The zirconium, hafnium, ... "Atomic layer deposition" ...
A capacitor structure is formed over a semiconductor substrate by atomic layer deposition ... insulating layer though an atomic ... hafnium oxide and zirconium ...
... wherein forming a layer of zirconium oxide includes forming a layer of zirconium oxide by atomic layer deposition. ... Genus, Inc: Radical ... a hafniumbased ...
... a zirconium and/or hafniumcontaining layer on a ... "Atomic layer deposition" ... Lanthanide oxide/zirconium oxide atomic layer deposited nanolaminate ...
Methods of using atomic layer deposition to deposit a high ... Atomic layer deposition of hafnium ... Lanthanide oxide/zirconium oxide atomic layer deposited ...
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